发明名称 METHOD AND APPARATUS FOR MISTED DEPOSITION OF THIN FILMS
摘要 <p>A liquid mass flow controller (15) controls the delivery of a precursor to a mist generator (12), which produces a charged mist. The mist passes into a velocity reduction chamber (636), and then flows into a deposition chamber (632) through inlet ports (688) in a mist inlet plate (682) that is both a partition between the chambers and a grounded upper electrode. The inlet plate (682) is located above and substantially parallel to the plane of the substrate (600) on which the mist is to be deposited. The substrate (600) is positively charged to accelerate the mist. There are 68.2 inlet ports per cm2 in an inlet port area (687) of 252 cm2 of the mist inlet plate (682) directly above the substrate (600). The inlet port area (687) is approximately equal to a substrate deposition area (601). An exhaust port (642) defines a channel about periphery of an exhaust plane parallel to and below the substrate plane.</p>
申请公布号 WO1999025895(A1) 申请公布日期 1999.05.27
申请号 US1998023753 申请日期 1998.11.09
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