发明名称 POLISHING METHOD AND POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a technique for polishing a work with a good yield and high precision. SOLUTION: A plural carriers 18 each of which has a fixed lower plate 11 provided with a lower-side grinding stone 12 and a fixed upper plate 13 provided with an upper-side grinding stone 14 to hold a work W, are engaged with sun gears 15 and internal gears 16. After polishing with both grinding stones 14, 12 is completed, before the fixed upper and lower plates 13, 11 are stopped, the sun gears 15 are stopped, thus to form a drawn-line on the surface of the work W. On the other hand, after the polishing is completed, the upper and lower fixed plates 13, 11 and the sun gears 15 are stopped at almost the same time, thus not to form the drawn-line. A drawn-line mode to form the drawn-line and a non-drawn-line mode not to form the drawn-line can be selected by an operator. When drawn-line work is done, the working amount can be randomly set.
申请公布号 JPH11138425(A) 申请公布日期 1999.05.25
申请号 JP19970305698 申请日期 1997.11.07
申请人 SYSTEMSEIKO CO LTD 发明人 KOBAYASHI RYOJI;MURAKAMI TAKASHI;YOSHIZAWA MANABU
分类号 B24B37/08 主分类号 B24B37/08
代理机构 代理人
主权项
地址