| 摘要 |
PROBLEM TO BE SOLVED: To enable eliminating vibration component transmitted from a preliminary chamber when a substrate is treated in a specimen chamber, and surely carry a substrate by restricting the relative position relation of the specimen chamber and the preliminary chamber when the substrate is carried. SOLUTION: An electron beam lithography equipment is provided with a lithography chamber 20 for performing pattern lithography treatment to a substrate 22, a robot chamber 30 having a vacuum robot 31 for carrying the substrate 22 to and from the chamber 20, a first linkage mechanism 40 of low rigidity which links spaces in the chambers 20, 30 and isolates the spaces from the viewpoint of vibration, and a second linkage mechanism 50 of high rigidity which restricts the relative position relation of the chambers 20, 30 and selectively connects them. Linkage by the second linkage mechanism 50 is released at the time of lithography treatment, and linkage by the second linkage mechanism 50 is performed at the time of carrying the substrate. |
