| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner wherein, when a position of an image plane of a reticule pattern is displaced from a wafer surface in optical-axis direction, accurate alignment is possible in the direction orthogonal to the optical axis. SOLUTION: Lighting optical systems 1-7 for lighting a mask 8 with radiation beam, and a projection optical system 13 for projecting an image of the pattern formed on the mask 8 onto a substrate 14, are provided. Here, in order to compensate a shift of a projection image in an image plane caused by movement of the image plane of the projection optical system 13 in Z direction along an optical axis 30 of the projection optical system, a calculation device 28 for calculating a position or shift amount of the projection image in an XY plane according to the position or movement amount of the substrate 14 in the Z direction based on the relationship between the position in Z direction and that in the XY plane vertical to the optical axis, and first alignment devices 17 and 20 for relatively moving the projection image and the substrate along the XY plane based on the calculated position or shift amount, are provided. |
