WAFER CARRIER FOR WAFER CLEANING

摘要

PROBLEM TO BE SOLVED: To provide a wafer carrier of wafer cleaning to prevent dust generated from the carrier from being stuck to the wafer at cleaning. SOLUTION: This wafer carrier 32 for wafer cleaning is provided with supporting parts 34A and 34B for supporting the wafer, while making a wafer surface vertical and cleans the wafer by immersing the wafer supported by the supporting parts 34A and 34B inside cleaning liquid flowing upwards. The supporting parts 34A and 34B are extended in a horizontal direction which is orthogonal to the wafer surface, formed as a pair of bar-shaped bodies to be in contact with a wafer peripheral edge 21 to support and arranged, so to be positioned on both the sides of the housed wafer directly below the horizontal direction center line of the wafer.