发明名称 PATTERN INSPECTING DEVICE
摘要 PROBLEM TO BE SOLVED: To make accurately processable image information at a high speed with a simple structure, by extracting a picture element information corresponding to the coordinate information of a feature portion, calculating an inspection size information corresponding to a reference size information, and comparing both size information for judgment. SOLUTION: A pattern measuring means (a) is radiates the circuit pattern of an inspection object with light and measures the reflected light as luminance data. An inspection information memory means (b) stores the measured luminance data for individual picture elements as inspection information. A reference information extracting means (c) specifies the feature portion of a bonding pad or the like based on the CAD data for manufacturing the circuit pattern, extracts the pattern boundary coordinates as size information and calculates the pattern width. An inspection information generating means (d) extracts the luminance data stored in the memory means (b) based on the extracted pattern boundary coordinates, determines the pattern boundary on the inspection information and calculates the boundary coordinates. A comparing/judging means (e) compares the reference size information and inspection size information on the specific portion of the circuit pattern and judges whether the specific portion is satisfactory or defective.
申请公布号 JPH11132723(A) 申请公布日期 1999.05.21
申请号 JP19970299771 申请日期 1997.10.31
申请人 FUJITSU LTD 发明人 TANIGUCHI SHIGEKI;ANDO MORITOSHI
分类号 G01B11/02;G01N21/88;G01N21/93;G01N21/956;G06T1/00;G06T7/00 主分类号 G01B11/02
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