HARD MASK FOR PRODUCTION OF SHADOW MASK AND ITS PRODUCTION, AND PRODUCTION OF SHADOW MASK USING HARD MASK

摘要

PROBLEM TO BE SOLVED: To obtain a hard mask as a photomask for the production of a shadow mask instead of an emulsion plate. SOLUTION: A metal layer 12 is formed by electroless plating on both surfaces of a substrate 11 which is transparent for UV rays. Then a resist pattern 13 is formed on the metal layer formed on at least one surface of the substrate. Then the metal layer 12 is patterned by using the resist pattern 13. Therefore, a metal film of a desired pattern can be formed without causing warpage of the glass substrate. and therefore, a good hard mask for the production of a shadow mask can be obtd.