PROJECTION EXPOSURE DEVICE, PROJECTION EXPOSURE METHOD, AND METHOD OF MANUFACTURING PROJECTION EXPOSURE DEVICE

摘要

An exposure device with a higher resolution, comprising a light source (1), an illumination optical system (3) for illuminating a pattern on a projection reticle (R) by a light beam from the light source (1), and a projection optical system (4) for projecting the image of the pattern on a photosensitive surface on a photosensitive wafer (W), wherein the light source (1) supplies light whose wavelength is shorter than 193 nm, a band narrowing device (2) which narrows the bandwidth of the spectrum of the light supplied by the light source (1), is provided, and the projection optical system includes a plurality of refractive optical devices all made of CaF2.