| 摘要 |
<p>A method and apparatus for producing nanoparticles at a high rate is disclosed. The system uses two chambers (305, 307) separated by a narrow duct (329). Contained within the lower chamber (305) is the source material, preferably heated with an electron gun (317) and fed with a continuous feeder (323) for extended nanoparticle production runs. The upper chamber (307) is used to nucleate the nanoparticles, the nanoparticles formed when the source vapor collides with a gas contained within the upper chamber. Depending upon the desired nanoparticles, the gas within the upper chamber is either inert or reactive. The duct (329) connecting the upper and lower chambers is narrow enough to allow differential pumping of the chambers. Furthermore, the vapor stream flowing through the duct at high speed provides a pumping action which helps to maintain differential pressures within the two chambers. At least a portion of the top surface (335) of the upper chamber is cooled, thus providing a condensation site for the nanoparticles. Periodically one or more scrappers (337) remove the condensed nanoparticles from the condensation surface, allowing them to collect within particle collection containers (339) surrounding the duct.</p> |
