| 摘要 |
<p>A failure resistant electrostatic chuck (20) for holding a substrate (35) during processing of the substrate (35) comprises one or more electrodes (25) covered by an insulator (30), the electrodes (25) capable of electrostatically holding a substrate (35) when a voltage is applied thereto. An electrical power bus (40) comprises one or more output terminals (45) that conduct voltage to the electrodes (25). The fuses (50) are positioned in hollow cavities (55) in the insulator (30), and electrically connect to the electrodes (25) in series to the output terminals (45) of the power bus (40). Each fuse (50) can electrically disconnect an electrode (25) from an output terminal (45) when the insulator (30) covering the electrode (25) punctures and exposes the electrode (25) to a plasma process environment thereby causing a plasma current discharge to flow through the fuse (50).</p> |
