| 摘要 |
<p>An electrostatic chuck (100) useful for holding a substrate (55) in a high density plasma, comprises a dielectric covered electrode (110) having at least one heat transfer gas flow conduit (150) therein. An electrical isolator (200) comprising dielectric material is positioned in the gas flow conduit (150) to (i) electrically isolate the gas in the conduit from the plasma or electrode (110), and (ii) allow passage of heat transfer gas through the conduit. Preferably, the dielectric material comprises a plasma-deactivating material that has a high surface area that reduces plasma formation of gas passing through the conduit (150) in a plasma process.</p> |
