| 摘要 |
<p>A negative-working photoresist composition comprising 1,4-dihydropyridine derivative as a photosensitive material and a polyamic acid, a heat-resisting photoresist composition comprising a photosensitive polyamic acid which is excellent in sensitivity and resolution and can be easily developed with an aqueous alkali solution is provided. The negative-working photoresist composition contains a polyamic acid and a 1,4-dihydropyridine derivative represented by following formula (I): <CHEM> wherein Ar represents an aromatic group having a nitro group at the ortho-position; R<1> represents an alkylene group having from 1 to 5 carbon atoms; and R<2>, R<3>, R<4>, and R<5> each represents a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms.</p> |
