发明名称 |
MATERIAL VAPOR DEPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To easily and economically form a thin coating film on a substrate. SOLUTION: This method is composed of a stage in which at least one stabilizing soln. of a preferable compd. and a solvent is produced, a stage in which a substrate 5 is arranged at the inside of a vacuum depositing chamber 2, a stage in which the mist of the stabilizing soln. is produced by using ultrasonic vibration and a stage in which the mist is flowed into the vacuum depositing chamber 2 proximately to the substrate 5 by using a nozzle device 8 in such a manner that the mist adheres onto the substrate 5 to form a layer of the stabilizing soln. |
申请公布号 |
JPH11131247(A) |
申请公布日期 |
1999.05.18 |
申请号 |
JP19980236014 |
申请日期 |
1998.08.21 |
申请人 |
SYMMETRICS CORP |
发明人 |
PAZ DE ARAUJO CARLOS A;MCMILLAN LARRY D;ROBERTS TOM L |
分类号 |
C23C16/30;B05D1/00;B05D3/04;B05D7/24;C23C16/44;C23C16/448;C23C16/455;C23C16/46;C23C16/48;C23C16/52;C23C18/12;C23C26/02;C30B7/00;H01L21/02;H01L21/285;H01L21/288;H01L21/314;H01L21/316;H01L41/24;H05K3/10 |
主分类号 |
C23C16/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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