发明名称 X-ray mask and method of fabricating the same
摘要 An antireflection film formed on a membrane of an X-ray mask has an amorphous structure. A patterned X-ray absorber intercepting transmission of X-rays is formed to be in contact with the front surface of the antireflection film. Thus, an X-ray mask having excellent pattern positional accuracy and a method of fabricating the same are obtained.
申请公布号 US5905005(A) 申请公布日期 1999.05.18
申请号 US19970949339 申请日期 1997.10.14
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 YABE, HIDEKI;KITAMURA, KAEKO;SASAKI, KEI
分类号 G21K5/02;H01L21/027;(IPC1-7):G03F9/00 主分类号 G21K5/02
代理机构 代理人
主权项
地址