发明名称 |
X-ray mask and method of fabricating the same |
摘要 |
An antireflection film formed on a membrane of an X-ray mask has an amorphous structure. A patterned X-ray absorber intercepting transmission of X-rays is formed to be in contact with the front surface of the antireflection film. Thus, an X-ray mask having excellent pattern positional accuracy and a method of fabricating the same are obtained.
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申请公布号 |
US5905005(A) |
申请公布日期 |
1999.05.18 |
申请号 |
US19970949339 |
申请日期 |
1997.10.14 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
YABE, HIDEKI;KITAMURA, KAEKO;SASAKI, KEI |
分类号 |
G21K5/02;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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