| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a boat for loading wafers capable of uniformly line- supporting the wafers even when the wafers are deformed by poor accuracy in workmanship of beams or the temperature distribution during the heat treatment. SOLUTION: A boat for loading wafers is used for a longitudinal heat treatment furnace, in which a large number of one set or a plurality of sets of two-beam pairs are horizontally supported by stays 12 with the prescribed intervals in the longitudinal direction. Each beam 11 is held in a rotatable manner by the prescribed angle relative to the stays 12. The center of gravity of the beams 11 is located below the center of rotation relative to the stays 12. Wafers can be line-supported as uniformly as possible, and the deflection and the stress concentration can be suppressed.</p> |
