发明名称 |
Synthesis of trifluoromethyl-substituted compounds |
摘要 |
Trifluoromethyl-substituted compounds are formed in a corona discharge or glow discharge plasma of trifluoromethyl radicals from an organic trifluoromethyl source. A substrate possessing easily replaceable ligands such as halogen or carbonyl, is initially contacted either in the plasma and within a short distance from a downstream visible edge of the plasma or outside of the visible portion of the plasma and within a short distance from the downstream visible edge, to effect a substitution of the halogen or carbonyl ligand on the substrate with a trifluoromethyl radical without substantial decomposition of the substrate.
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申请公布号 |
US3954585(A) |
申请公布日期 |
1976.05.04 |
申请号 |
US19740444465 |
申请日期 |
1974.02.21 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
LAGOW, RICHARD J.;GERCHMAN, LOIS L.;JACOB, ROBERT A. |
分类号 |
B01J12/00;C07C17/26;C07C395/00;C07F3/10;C07F5/00;C07F5/06;C07F7/22;(IPC1-7):B01K1/00;C07F7/00;C07F17/00 |
主分类号 |
B01J12/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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