发明名称 Synthesis of trifluoromethyl-substituted compounds
摘要 Trifluoromethyl-substituted compounds are formed in a corona discharge or glow discharge plasma of trifluoromethyl radicals from an organic trifluoromethyl source. A substrate possessing easily replaceable ligands such as halogen or carbonyl, is initially contacted either in the plasma and within a short distance from a downstream visible edge of the plasma or outside of the visible portion of the plasma and within a short distance from the downstream visible edge, to effect a substitution of the halogen or carbonyl ligand on the substrate with a trifluoromethyl radical without substantial decomposition of the substrate.
申请公布号 US3954585(A) 申请公布日期 1976.05.04
申请号 US19740444465 申请日期 1974.02.21
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY 发明人 LAGOW, RICHARD J.;GERCHMAN, LOIS L.;JACOB, ROBERT A.
分类号 B01J12/00;C07C17/26;C07C395/00;C07F3/10;C07F5/00;C07F5/06;C07F7/22;(IPC1-7):B01K1/00;C07F7/00;C07F17/00 主分类号 B01J12/00
代理机构 代理人
主权项
地址