| 发明名称 |
Pattern formation |
| 摘要 |
<p>A precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous developer (hereinafter the "developer resistance means"), wherein said developer resistance means comprises one or more compounds which include a poly(alkylene oxide) unit.</p> |
| 申请公布号 |
AU9552898(A) |
申请公布日期 |
1999.05.17 |
| 申请号 |
AU19980095528 |
申请日期 |
1998.10.26 |
| 申请人 |
HORSELL GRAPHIC INDUSTRIES LIMITED |
发明人 |
CHRISTOPHER DAVID MCCULLOUGH;KEVIN BARRY RAY;ALAN STANLEY VICTOR MONK;JOHN DAVID RICHES;ANTHONY PAUL KITSON;GARETH RHODRI PARSONS;DAVID STEPHEN RILEY;PETER ANDREW REATH BENNETT;RICHARD DAVID HOARE;JAMES LAURENCE MULLIGAN;JOHN ANDREW HEARSON;CAROLE-ANNE SMITH;STUART BAYES;MARK JOHN SPOWAGE |
| 分类号 |
G03F7/004;B41C1/10;B41M5/26;B41M5/36;B41M5/40;B41M5/46;G03F7/022;G03F7/075;(IPC1-7):B41M5/36 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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