| 摘要 |
<p>A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist (114), from a substrate surface (104). A beam of light (134) is projected onto the substrate surface (104) and the fluoresced and/or reflected light intensity (138) at a particular wavelength band is measured by a light detector (142). The light intensity is converted to a numerical value and transmitted electronically to a control mechanism (124) which determines the proper disposition of the substrate. The control mechanism (124) controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber (102).</p> |
