发明名称 GRAY SCALE MASK AND DEPTH PATTERN TRANSFER TECHNIQUE USING INORGANIC CHALCOGENIDE GLASS
摘要 A method of producing a high resolution expanded analog gray scale mask is described. Using an inorganic chalcogenide glass, such as a selenium germanium, coated with a thin layer of silver, a gray scale mask may be produced with accurate control of the size, uniformity and variance of the pixels. The selenium germanium glass is composed of column structures arranged perpendicularly to the substrate giving a possible edge precision of 100 ANGSTROM . The column structures also prevent undercutting during the etching process, thus permitting pixels to be placed close together. Accordingly, selenium germanium may be used as a high resolution gray scale mask with an expanded analog gray scale. The gray scale mask may be used to impress information as a modulated thickness on a selenium germanium photoresist layer on an inorganic substrate. The selenium germanium photoresist layer may then transfer the gray scale to the substrate.
申请公布号 EP0914629(A1) 申请公布日期 1999.05.12
申请号 EP19980923353 申请日期 1998.05.15
申请人 AERIAL IMAGING CORPORATION 发明人 BLOCK, BARRY;THORNTON, ARNOLD, O.;INGVERSEN, JAN;DASCHNER, WALTER
分类号 B81B1/00;B81C1/00;G03F1/00;G03F1/54;G03F7/00;G03F7/004 主分类号 B81B1/00
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