发明名称 |
Process for producing high purity silicon carbide powder for preparation of a silicon carbide single crystal and single crystal |
摘要 |
A process for producing high purity silicon carbide uses a high purity tetraethoxysilane or the like as the silicon source and a novolak-type phenol resin or the like as the carbon source. The process comprises a step of forming silicon carbide in which silicon carbide powder is prepared by calcining a mixture of these sources in a non-oxidizing atmosphere, and a step of post-treating silicon carbide in which the silicon carbide powder thus obtained is treated by heating at a temperature of 2000 DEG to 2100 DEG C. for 5 to 20 minutes at least once while the silicon carbide powder is kept at a temperature of 1700 DEG or higher to lower than 2000 DEG C., to obtain silicon carbide powder having an average particle diameter of 10 to 500 mu m and a content of impurity elements of 0.5 ppm or less. The high purity silicon carbide powder is advantageously used as a material for producing an excellent silicon carbide single crystal having a decreased number of crystal defects. |
申请公布号 |
GB2301349(B) |
申请公布日期 |
1999.05.12 |
申请号 |
GB19950020185 |
申请日期 |
1995.10.03 |
申请人 |
* BRIDGESTONE CORPORATION |
发明人 |
MASASHI * KANEMOTO;SHINOBU * ENDO;MASAO * HASHIMOTO |
分类号 |
C01B31/36;C30B23/00 |
主分类号 |
C01B31/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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