发明名称 Polishing apparatus and method
摘要 <p>The invention provides for polishing apparatus comprising a movably mounted polishing pad sensing means mounted to measure distances to portions of the polishing pad in a target area of the sensing means and analysing means coupled to the sensing means, wherein the analysing means is arranged to determine from the measured distances whether an operation should be performed on the apparatus. <IMAGE></p>
申请公布号 EP0914908(A2) 申请公布日期 1999.05.12
申请号 EP19980309064 申请日期 1998.11.05
申请人 APLEX, INC. 发明人 TZENG, HUEY-MING
分类号 B23Q17/09;B23Q17/24;B24B37/04;B24B49/00;B24B49/12;H01L21/306;H01L21/66;(IPC1-7):B24B37/04 主分类号 B23Q17/09
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