发明名称 STAGE FOR HIGH VACUUM
摘要 <p>PROBLEM TO BE SOLVED: To adjust the position of the sample holding section of a stage for high vacuum by moving the section, without providing any mechanism for driving the stage for high vacuum in a high vacuum chamber in which the sample supporting section is provided. SOLUTION: A stage for high vacuum is provided with a connecting arm 4, which is extended in an x-axis direction perpendicular to a partition wall 2 dividing a high vacuum chamber A1 and a low vacuum chamber A2 from each other through an arm through-hole 3 formed through the wall 2, an X-Y table 8 which supports the part of the arm 4 staying in the low vacuum chamber A2, a panel 14 for forming an orifice which is arranged adjacent along the wall 2 at an interval Sp from the wall 2 to form an orifice as an air flow passage, and a pipe member 13, which covers the outer peripheral surface of the arm 4 with an interval Sa from the outer peripheral surface to form an orifice as an air flow passage.</p>
申请公布号 JPH11126817(A) 申请公布日期 1999.05.11
申请号 JP19970291419 申请日期 1997.10.23
申请人 JEOL LTD 发明人 OI KORO
分类号 H01L21/66;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/66
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