SUBSTRATE FOR DISPLAY DEVICE, LIQUID CRYSTAL DEVICE USING THIS SUBSTRATE, DISPLAY DEVICE, PROJECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE, AND PRODUCTION OF SUBSTRATE FOR DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To improve the mechanical strength at the foot of the sepn. regions between pixel electrodes and to improve the thermal resistance, by disposing metallic regions of a high m.p. at the foot of the sepn. regions existing between the pixel electrodes. SOLUTION: A plasma SiO3 film is deposited over the entire surface of a p-type silicon semiconductor substrate 301. This film is so patterned as to allow only the sepn. regions between the pixels to remain. A plasma SiN film is thereafter deposited over the entire surface of the substrate 301. TiN 105 is deposited over the entire surface of the substrate 301. Next, tungsten 106 is deposited over the entire surface of the substrate 301. The entire surface of the substrate 301 is etched. Next, the pixel electrodes 312 are deposited over the entire surface of the substrate 301. The surfaces of the pixel electrodes 312 are polished by mechanical polishing down to the same plane as the plane on the peaks of the sepn. regions between the pixels. Since the etching ions hardly reach the foot of the sepn. regions between the pixels, the tungsten remains there.