| 摘要 |
<p>PROBLEM TO BE SOLVED: To perform stable opening and closing or regulation operation of a flow rate even when unstable gas, such as raw material gas, being a material for forming a thin film of a high and ferroelectric substance. SOLUTION: In this valve device, flow passages 20 and 26 for handling fluid a valve element 14 to open and close the flow passages, and valve mechanisms 44 and 46 to operate the valve element 14 are arranged in casings 10 and 12. In this case, the valve element 14 comprises a handling fluid space containing a flow passage; and a diaphragm having flexibility and partitioning a valve mechanism space, containing the valve mechanisms 44 and 46. A heating medium space 38 to insulate the heat of the valve element 14 is formed on the mechanism space side of the valve element 14.</p> |
