METHOD FOR CORRECTING AND DECIDING COORDINATES OF OBJECTIVE POINT ON WAFER

摘要

PROBLEM TO BE SOLVED: To correct or decide the coordinates of an objective point on a wafer by taking into consideration the positional deviation caused by the deformation of a stage. SOLUTION: Coordinate correction information indicating the relation, between actually measured stage coordinate values containing positional deviation components derived from the deformation of a stage and ideal stage coordinate values containing no positional deviation component, is found on a plurality of coordinate correcting reference points set on a wafer WF0 for correcting coordinates placed on the stage. Then, a plurality of measuring points PM1-PM15 are set on a reference wafer WF1 for setting measuring point. At the time of setting the points PM1-PM15, the stage coordinate values of the points PM1-PM15 are also measured. The actually measured stage coordinate values are corrected, based on the coordinate correction information and changed to wafer coordinate values through coordinate transformation. When measurement is performed on a wafer WF2 to be measured, corrected stage coordinate values containing the positional deviation components derived from the deformation of the stage are found by performing coordinate transformation on the wafer coordinate values of the points PM1-PM15, and by correcting the coordinate-transformed wafer coordinate values based on the coordinate correction information.