发明名称 EXPOSURE METHOD, EXPOSURE DEVICE AND PRODUCTION OF OPTICAL MASTER DISK
摘要 PROBLEM TO BE SOLVED: To make it possible to exactly set the timing of modulation and/or deflection with respect to respective laser beams and the each other's positions of respective laser spots by discretely executing the modulation and/or deflection with respect to the respective laser beams at the time of executing exposure by the plural laser beams. SOLUTION: The plural laser beams are subjected to light intensity modulation and/or deflection by modulation elements 103AOM1 , 103AOM2 in synchronization and are condensed to a surface S to be exposed. The prescribed regions of the surface to be exposed are subjected to irradiation with the plural laser beam spots. The difference in the delay times of the light intensity modulation of the plural laser beams and/or the positions of the laser beam spots at the surface to be exposed are detected, by which the modulation time and/or deflection of the modulation elements is controlled.
申请公布号 JPH11126337(A) 申请公布日期 1999.05.11
申请号 JP19970291069 申请日期 1997.10.23
申请人 SONY CORP 发明人 IMANISHI SHINGO
分类号 G11B7/00;G11B7/0045;G11B7/085;G11B7/125;G11B7/26 主分类号 G11B7/00
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