发明名称 Resonant chamber applicator for remote plasma source
摘要 A remote source of partially ionized plasma gas having ions and excited neutral atom species therein is provided. A chamber having a metallic outer shell and an inner insulative tube, is operated as a microwave resonant cavity, preferably having a diameter of about one quarter of the operating wavelength. A waveguide couples microwave energy from a source to a slot cut into the metallic outer shell of the cavity. Microwave energy passes through the inner energy transparent tube and excites reactant gases supplied from an input tube. Plasma is conducted from the cavity by a plasma output tube coupled into a processing chamber and controlled pressure pumping system.
申请公布号 US5902404(A) 申请公布日期 1999.05.11
申请号 US19970811401 申请日期 1997.03.04
申请人 APPLIED MATERIALS, INC. 发明人 FONG, GARY;SILVESTRE, IRWIN;TRUONG, QUOC
分类号 H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H05H1/46;(IPC1-7):C23C16/00 主分类号 H01J37/32
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