发明名称 CORRECTING METHOD OF DEFECT IN EMULSION MASK OR THE LIKE
摘要 PROBLEM TO BE SOLVED: To correct white defects with high accuracy by a simple method without increasing the scale of a series of equipments for coating, vapor deposition, sputtering or the like used for a hard mask in the process of correcting defects in an emulsion mask or the like. SOLUTION: In a method for correcting defects in an emulsion mask (A) or the like, for the defects of white defects such as pinholes and chipping in an image (C), etc., printed on an emulsion layer (b) of the emulsion mask (A), etc., a weak adhesive film as a removable adhesion preventing layer of a synthetic resin is stuck to the surrounding including the defects. The film is irradiated with a UV laser beams coinciding with the defects to remove the defects together with the adhesion preventing layer (d). After a light-shielding material is applied on the defects in the removed part, the adhesion preventing layer is peeled and removed, while remaining the light-shielding material in the defects.
申请公布号 JPH11125895(A) 申请公布日期 1999.05.11
申请号 JP19980221725 申请日期 1998.08.05
申请人 DAINIPPON PRINTING CO LTD 发明人 HASHIMOTO HIROYUKI;WATANABE KAZUO
分类号 B23K26/40;G03F1/72;H01L21/027 主分类号 B23K26/40
代理机构 代理人
主权项
地址