发明名称 Blast engraving mask is made by UV exposure of a photosensitive polymer on waterproof paper
摘要 A blast engraving mask is made by UV exposure, through a positive (4), of a photosensitive polymer (3) on a waterproof paper sheet (1) and removing non-exposed polymer to leave abrasion blocking regions. A blasting mask is made by applying a photosensitive polymer solution (3) onto the uncoated surface of a paper sheet (1) which has a water repellant film (2) on its other surface, forming a positive (4) on a thin translucent support, applying the polymer side of the coated sheet (1) against the positive (4), exposing (I) the combination to UV light, removing the positive and removing non-exposed polymer to form, on the polymer side of the sheet, regions which block the abrasive action of blasting. An Independent claim is also included for a mask made by the above process.
申请公布号 FR2770453(A1) 申请公布日期 1999.05.07
申请号 FR19970014068 申请日期 1997.11.04
申请人 HD GRAVURES 发明人 HOUY PASCAL
分类号 B41C1/00;B44C1/22;C03C19/00;G03F7/12;(IPC1-7):B44B11/00;B05C17/06 主分类号 B41C1/00
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