Adjusting system for interferometer for measuring reflecting surfaces

摘要

The adjusting system includes an adjusting element, which is arranged in the focal plane of a collimator objective arranged in the front of the specimen surface. A two dimensional spread adjustment marking (JM) is arranged on the adjusting element (JE), and/or the adjusting marking (JM) arranged on the adjusting element (JE), has a selected optical effect. The adjusting system (JUV) includes a light source, a condenser optic and a deflecting unit (UE) with a central passage opening (D) around the optical axis (OA).