RAPID THERMAL PROCESSING (RTP) SYSTEM WITH ROTATING SUBSTRATE
摘要
A rapid thermal processing (RTP) chamber, wherein one wall of the chamber supporting a substrate rotates with respect to the rest of the chamber so that the substrate being treated in the RTP chamber is relatively rotated with respect to the lamps heating the substrate.
申请公布号
WO9922402(A2)
申请公布日期
1999.05.06
申请号
WO1998EP06741
申请日期
1998.10.23
申请人
STEAG AST ELEKTRONIK GMBH
发明人
BLERSCH, WERNER;GRUENWALD, PETER;MAURER, MICHAEL;MERKLE, HELMUT;THEILER, THOMAS;WALK, HEINRICH
