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发明名称
Method of treating substrate and apparatus for the same
摘要
申请公布号
EP0858099(A3)
申请公布日期
1999.05.06
申请号
EP19980105839
申请日期
1991.10.18
申请人
KABUSHIKI KAISHA TOSHIBA
发明人
OKUMURA, KATSUYA
分类号
G03F7/30;C25D5/02;C25D7/12;H01L21/00;H01L21/027;H01L21/30;H01L21/304;H01L21/60;(IPC1-7):H01L21/00
主分类号
G03F7/30
代理机构
代理人
主权项
地址
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