发明名称 IMPROVED PLASMA SPRAYING METHOD AND APPARATUS
摘要 <p>A method of depositing a coating (108) of spray particles from a coating material feed (102) onto a target substrate (106). A plasma arc is provided in a gas through which passes a plasma arc current. The plasma arc current is modulated by plasma arc current pulses having a frequency and a magnitude. The coating (108) is provided by injecting the coating material into the plasma arc from a coating material feed (102). The deposition rate of spray coating (108) is measured. The standoff distance (110) between the target substrate (106) and the coating material feed (102) is adjusted to provide maximum deposition rate. Other features of the spray process can also be measured and adjusted.</p>
申请公布号 WO1999022042(A1) 申请公布日期 1999.05.06
申请号 US1998022011 申请日期 1998.10.19
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址