发明名称 Method of applying quantum points to surfaces for manufacturing semiconductors
摘要 The method involves the use of a structured mask which is first provided with the material of the quantum points and then brought into contact with the surface to transfer the material from the mask to the surface. Finally, the mask is removed from the surface.
申请公布号 DE19755051(C1) 申请公布日期 1999.05.06
申请号 DE1997155051 申请日期 1997.12.11
申请人 ROBERT BOSCH GMBH, 70469 STUTTGART, DE 发明人 GRUENWALD, WERNER, DR., 70839 GERLINGEN, DE;SCHMID, GUENTER, PROF., 42555 VELBERT, DE
分类号 H01L21/20;H01L33/00;H01S5/34;(IPC1-7):H01L21/20;H01L29/15 主分类号 H01L21/20
代理机构 代理人
主权项
地址