| 摘要 |
There is disclosed a method for forming fine patterns in a semiconductor device, comprising the steps of: providing a silicon substrate; coating a pattern material on the surface of the silicon substrate to form a layout of pattern; additionally arranging a plurality of dummy patterns, each having a smaller size than the minimum size at which patterning is not permitting, on the surface of the silicon substrate including the area of said layout; preparing a reticle by use of the layout where said fine dummy patterns are arranged; and exposing the layout on the silicon substrate through said reticle to light, which enables the patterns to have as accurate a width as desired, irrespective of the pattern density, whereby the production yield of the semiconductor device can be greatly improved.
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