发明名称 |
METHOD AND APPARATUS FOR ANALYZING CONTAMINATIVE ELEMENT CONCENTRATIONS |
摘要 |
The fluorescent X-ray generated by elements when an X-ray is total reflected from a substrate surface is detected by a fluorescent X-ray detecting circuit; the fluorescent X-ray peak generated by the substrate element and the fluorescent X-ray peaks generated by contaminative elements are separated by a peak separating circuit; an integral intensity I0 of the fluorescent X-ray peak generated by the substrate element and integral intensities I of the fluorescent X-ray peaks generated by the contaminative elements are calculated by an integral intensity calculating circuit, respectively; and contaminative element concentrations N=N0x( eta 0 / I0)x(I / eta ) (where N0 denotes the surface concentration of the substrate; eta 0 denotes the fluorescent yield of the substrate; and eta denotes the fluorescent yield of the contaminative elements) are calculated by a contaminative element concentration calculating circuit on the basis of the calculated integral intensities I0 and I. The contaminative elements can be analyzed non-destructively without use of any analytical curves, so that it is possible to save much labor required to prepare the analytical curves. |
申请公布号 |
KR172623(B1) |
申请公布日期 |
1999.05.01 |
申请号 |
KR19940030850 |
申请日期 |
1994.11.23 |
申请人 |
TOSHIBA KK. |
发明人 |
KOMATSU, FUMIO;MIYAZAKI, KUNIHIRO;SHIMAZAKI, AYAKO |
分类号 |
G01N23/223;(IPC1-7):G01N21/00 |
主分类号 |
G01N23/223 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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