发明名称 Electrical contact manufacture process for use in pressure or acceleration detector
摘要 The technique uses a sacrificial layer between the conducting and insulating layers to define space within which contact is formed. The structure includes at least one electrical contact (32) formed in a first electrically conducting layer (24). The conducting layer adjoins a substrate (20) which is electrically insulating. The substrate has a hole formed though it, and the contact (32) is formed on the surface of the conductor which faces the hole. A further sacrificial layer (22) is provided between the conducting and insulating layers, and this surface is etched in order to form the cavity within which the contact is formed. The contact is created by deposition of metal on the rear surface through the hole. The sacrificial layer (20) may also serve as the stop layer in the formation of the hole through the substrate.
申请公布号 FR2770339(A1) 申请公布日期 1999.04.30
申请号 FR19970013441 申请日期 1997.10.27
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 CAPLET STEPHANE;DELAYE MARIE THERESE
分类号 G01B7/00;G01L9/00;H01L21/768;H01L23/48;(IPC1-7):H01L21/71;H01L23/485 主分类号 G01B7/00
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