发明名称 INFRARED EMITTING DIODE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To reduce a recombined current component in a depletion layer so as to prevent an infrared emitting diode from deteriorating in optical output at a low current, by a method wherein a P-type epitaxial thin film high in dopant concentration is interposed between an N-type GaAs epitaxial layer and a P-type GaAs epitaxial layer. SOLUTION: An N-type GaAs epitaxial layer 2, a P-type GaAs epitaxial thin film 3, and a P-type GaAs epitaxial layer 4 are formed on an N-type GaAs substrate 1. At this point, the P-type GaAs epitaxial layer 4 is set at a certain dopant concentration so as to obtain emission light of prescribed wavelength near the P-type epitaxial thin film 3 which functions as a light emitting part. The P-type epitaxial thin film 3 is set higher in dopant concentration than the P-type GaAs epitaxial layer 4 near to it. By this setup, an infrared emitting diode of this constitution can be less deteriorated in optical output at a low current.
申请公布号 JPH11121792(A) 申请公布日期 1999.04.30
申请号 JP19970277741 申请日期 1997.10.09
申请人 SHARP CORP 发明人 AKAI MITSUKUNI
分类号 H01L33/30 主分类号 H01L33/30
代理机构 代理人
主权项
地址