| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection exposure device, wherein only a specific aberration of a projection optical system is easily corrected, with less degradation in exposure performance with respect to condition change in lighting light. SOLUTION: A first drive part 63a provide at a parallel plate drive device 63 adjusts a relatively rotating position between a first member 82 and a second member 83 to tilt a parallel flat plate 81 by a desired angle from a plane vertical to an optical axis AX. Thus, only an eccentric coma aberration in a specific direction, occurring at a main body part 70 due to changes in exposure condition can be corrected independently. Meanwhile, a second drive part 63b adjusts a relatively rotating position between the first member 82 and the main body part 70 to appropriately set a tilt direction of the parallel flat plate 81. Thus, a correction direction of an eccentric coma aberration caused by changes in exposure condition is adjusted. |
