发明名称 DEVICE FOR PLASMA PROCESSING OF GASES
摘要 An apparatus (1) for the processing of gaseous media by means of a plasma wherein there is included at least one electrode (16, 14) which is maintained in position in relation to another by one or more insulating support structures (7, 8) made of a micaceous glass material.
申请公布号 WO9920373(A1) 申请公布日期 1999.04.29
申请号 WO1998GB03059 申请日期 1998.10.09
申请人 AEA TECHNOLOGY PLC;WEEKS, DAVID, MICHAEL;SEGAL, DAVID, LESLIE 发明人 WEEKS, DAVID, MICHAEL;SEGAL, DAVID, LESLIE
分类号 F01N3/08;B01D53/32;B01D53/92;B01J19/08;(IPC1-7):B01D53/32 主分类号 F01N3/08
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