发明名称 Improvements relating to annealing
摘要 <p>A method and apparatus for annealing an integrated ferroelectric device ( 10 ) is disclosed in which the device ( 10 ) comprises a first layer of material capable of existing in a ferroelectric state and a second layer of material defining an integrated circuit below the first layer such as a microbridge thermal detector. The method comprises producing a pulse of energy, extending the pulse temporally using a pulse extender ( 200 ) and illuminating the first layer with the extended pulse. The duration and wavelength and fluence of the extended pulse are selected so that the material of the first layer is annealed into a ferroelectric state without exceeding the temperature budget of the integrated circuit. Application of the method in heating other articles which comprise a layer to be heated and a temperature sensitive layer is also disclosed. By extending the temporal width of the pulse, energy is supplied at a rate which ensures a more even heating of the first layer without damaging the temperature sensitive layer over time.</p>
申请公布号 GB9905098(D0) 申请公布日期 1999.04.28
申请号 GB19990005098 申请日期 1999.03.06
申请人 SECRETARY OF STATE FOR DEFENCE, THE 发明人
分类号 G01J1/02;B23K26/00;B23K101/40;G01J5/02;G01J5/34;H01L21/268;H01L21/316;H01L21/8246;H01L27/105;H01L27/14;H01L31/18;H01L37/00;H01L37/02;H01L41/22 主分类号 G01J1/02
代理机构 代理人
主权项
地址