HIGH-RADIATION GLASS BASE COVERING MATERIAL, HIGH-RADIATION GLASS FILM, AND PROCESS FOR THE PRODUCTION OF HIGH-RADIATION GLASS FILM

摘要

A glass paste includes a silica glass film (silica glass layer) having a predetermined thickness, which is provided to cover each of pigment particles constituted by silicon tetraboride, and which includes silicon dioxide such that the content of the silicon dioxide in the silica glass film (silica glass layer) is higher than that of the silicon dioxide in each portion of a glass structure which is adjacent to the corresponding pigment particle. A glass coating which is obtained by firing this paste applied to the surface of a substrate is provided, at its interface between each of the pigment particle and the glass structure, with the silica glass film (silica glass layer) which has a comparatively low reactivity with the pigment particle owing to its higher content of the silicon dioxide than that in the glass structure. The provision of the silica glass film (silica glass layer) at the interface permits effective restraint of an interface reaction between the pigment particles and the glass structure while the glass coating is produced or used.