发明名称 |
Selected adjustment of dropwise condensation on ion implanted surfaces |
摘要 |
Process for selected adjustment of dropwise condensation on a surface comprising implanting nitrogen ions with a theoretically predicted minimum dose concentration of 1015 cm-2, the wetting characteristics of the surface being adjusted without cleaning or other preparation steps in such a way that stable dropwise condensation is formed on the surface and the intensity of condensation and thus heat transfer performance can be selected using the level of the dose concentration. |
申请公布号 |
AU1029399(A) |
申请公布日期 |
1999.04.27 |
申请号 |
AU19990010293 |
申请日期 |
1998.10.02 |
申请人 |
ESYTEC ENERGIE- UND SYSTEMTECHNIK GMBH |
发明人 |
ALFRED LEIPERTZ;KYONG-HEE CHOI |
分类号 |
C23C14/48;F28F13/04;F28F13/18 |
主分类号 |
C23C14/48 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|