发明名称 Selected adjustment of dropwise condensation on ion implanted surfaces
摘要 Process for selected adjustment of dropwise condensation on a surface comprising implanting nitrogen ions with a theoretically predicted minimum dose concentration of 1015 cm-2, the wetting characteristics of the surface being adjusted without cleaning or other preparation steps in such a way that stable dropwise condensation is formed on the surface and the intensity of condensation and thus heat transfer performance can be selected using the level of the dose concentration.
申请公布号 AU1029399(A) 申请公布日期 1999.04.27
申请号 AU19990010293 申请日期 1998.10.02
申请人 ESYTEC ENERGIE- UND SYSTEMTECHNIK GMBH 发明人 ALFRED LEIPERTZ;KYONG-HEE CHOI
分类号 C23C14/48;F28F13/04;F28F13/18 主分类号 C23C14/48
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