发明名称 LOW-MELTING GLASS COMPOSITION SUITABLE TO ELECTRODE COATING
摘要 PROBLEM TO BE SOLVED: To form a transparent insulated glass film without lowering the properties as a transparent electrode material at the time of using as a plane display by constituting substantially the film of a PbO, B2 O3 and SiO2 having a specified composition. SOLUTION: The low-melting glass composition is composed of 60-80% PbO, 0-5% B2 O3 and 20-40% SiO2 based on oxide wt.%. The PbO is an indispensable constituent for converting the glass to low melting point. The B2 O3 is the constituent for converting the PbO based low-melting glass to a stable glass, but when it is <=5%, an erosive property of the low-melting glass to a transparent electrode material such as ITO, tin oxide at the time of coating is remarkably suppressed. Therefore, it may be kept at <=4%. The SiO2 is the indispensable constituent for converting the glass to the stable glass. The low-melting glass has preferably an average thermal expansion coefficient of 70-90×10<-7> / deg.C at 50-300 deg.C, and in this way, a wrap and deterioration of strength of the glass substrate are prevented.
申请公布号 JPH11116271(A) 申请公布日期 1999.04.27
申请号 JP19970277719 申请日期 1997.10.09
申请人 ASAHI GLASS CO LTD 发明人 MANABE TSUNEO;TAGUCHI SHUJI;ONODA HITOSHI;AOKI YUMIKO
分类号 C03C8/10;C03C8/24;(IPC1-7):C03C8/10 主分类号 C03C8/10
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