发明名称 |
Pore-free sintered bodies on the basis of silicon carbide which are suitable as substrates for hard disks, and methods for the fabrication thereof |
摘要 |
Dense sintered bodies are provided which a) comprise from 45 to 99.5 wt % of SiC, the SiC being present in the sintered body as a crystalline first phase, and b) comprise from 0.5 to 55 wt % of a sintering aid, from 0.5 to 30 wt % of which is selected from the group consisting of reaction products of Al2O3 with Y2O3, mixtures of at least one nitrogen-containing aluminum compound with reaction products of Al2O3 with Y2O3, mixtures of at least one rare earth oxide with at least one nitrogen-containing aluminum compound and/or Al2O3, and from 0 to 25 wt % of which is selected from the group of the nitridic silicon compounds, the sintering aid being present in the sintered body as a second phase and optionally further phases, wherein the second phase and optionally the further phases are either amorphous to an extent of more than 10% or are present in amorphous form at the interface to the first phase to a width of at least >/=5 ANGSTROM , and the polished surface of the sintered body does not contain any pores having a diameter >1 mu m.
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申请公布号 |
US5898008(A) |
申请公布日期 |
1999.04.27 |
申请号 |
US19970902001 |
申请日期 |
1997.07.29 |
申请人 |
ELEKTROSCHMELZWERK KEMPTEN GMBH |
发明人 |
KOLKER, HELMUT;SIGL, LORENZ;KEMPF, THOMAS |
分类号 |
C04B35/565;G11B5/62;G11B5/73;G11B5/733;G11B5/84;(IPC1-7):C04B35/569 |
主分类号 |
C04B35/565 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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