发明名称 Diffusion bonded interconnect
摘要 A method of interconnecting integrated circuit chips to a substrate during the assembly of a multi-chip module. Instead of forming an electrical and physical bond by reflowing solder bumps attached to the pads of the chips and the substrate, as in flip-chip bonding, thin pads of specially selected dissimilar metals placed on the chips and substrate are connected by a solid-state diffusion bonding process. In one embodiment, the I/O pads on a chip are formed from aluminum or an aluminum alloy and are aligned and placed into physical contact with corresponding metal pads or metal layered pads on a substrate, where the metal is capable of being diffusion bonded to aluminum. The combination of chip(s) and substrate are then heated in a controlled atmosphere at a temperature and for a time sufficient to cause solid-state diffusion bonding to occur.
申请公布号 US5897341(A) 申请公布日期 1999.04.27
申请号 US19980109655 申请日期 1998.07.02
申请人 FUJITSU LIMITED 发明人 LOVE, DAVID G.;MORESCO, LARRY L.
分类号 H01L25/18;H01L21/60;H01L25/04;(IPC1-7):H01L21/44;H01L21/48;H01L21/50 主分类号 H01L25/18
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