发明名称 |
Diffusion bonded interconnect |
摘要 |
A method of interconnecting integrated circuit chips to a substrate during the assembly of a multi-chip module. Instead of forming an electrical and physical bond by reflowing solder bumps attached to the pads of the chips and the substrate, as in flip-chip bonding, thin pads of specially selected dissimilar metals placed on the chips and substrate are connected by a solid-state diffusion bonding process. In one embodiment, the I/O pads on a chip are formed from aluminum or an aluminum alloy and are aligned and placed into physical contact with corresponding metal pads or metal layered pads on a substrate, where the metal is capable of being diffusion bonded to aluminum. The combination of chip(s) and substrate are then heated in a controlled atmosphere at a temperature and for a time sufficient to cause solid-state diffusion bonding to occur.
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申请公布号 |
US5897341(A) |
申请公布日期 |
1999.04.27 |
申请号 |
US19980109655 |
申请日期 |
1998.07.02 |
申请人 |
FUJITSU LIMITED |
发明人 |
LOVE, DAVID G.;MORESCO, LARRY L. |
分类号 |
H01L25/18;H01L21/60;H01L25/04;(IPC1-7):H01L21/44;H01L21/48;H01L21/50 |
主分类号 |
H01L25/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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