发明名称 CLEANING METHOD BY PHOTOCATALYTIC SEMICONDUCTOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a cleaning method for the environment or the like such as sterilization, deodorization, elimination of odor and soil prevention by utilizing a function and a phenomenon on the surface of a photocatalytic semiconductor and also allowing the gas and liquid which has been subjected to activation treatment using the photocatalytic semiconductor to act. SOLUTION: The cleaning of the environment or the like such as sterilization, deodorization, elimination of odor and soil prevention is carried out allowing gas or liquid which has been subjected to activation treatment using a photocatalytic semiconductor to act under the conditions wherein it is separated from the surface of a photocatalytic body, in the absence of the photocatalytic body, under the conditions wherein a function of the photocatalyst is stopped or under the conditions wherein it is separated form the surface of the photocatalytic body and the function of the photocatalyst is stopped. Cleaning action is enhanced by adding an oxidizing agent to gas or liquid which has been subjected to activation treatment using the photocatalytic semiconductor.</p>
申请公布号 JPH11114416(A) 申请公布日期 1999.04.27
申请号 JP19970250793 申请日期 1997.09.16
申请人 TAO:KK 发明人 OGATA SHIRO;TANAKA TETSUO
分类号 B08B7/00;A61L2/18;A61L2/20;B01J21/06;B01J35/02;C02F1/30;C02F1/72;C02F1/76;C02F1/78;(IPC1-7):B01J21/06 主分类号 B08B7/00
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