发明名称 ELECTROSTATIC SUCKING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide an electrostatic sucking device with superior withstanding characteristics and good electrostatic force, without a small crack or pores in the dielectric layer after sintering, in which put-off performance by stopping an applying voltage is prevented from deteriorating and volume specific resistance of an insulating dielectric layer at an electrostatic sucking member is reduced. SOLUTION: When a voltage is applied to a conductive electrode 1 covered by an insulating dielectric layer 2, a work piece is electrostatically sucked by the insulating dielectric layer 2. The insulating dielectric layer 2 is mainly made of ceramics containing an additional single metal of 0.1 to 30 wt.% with a volume specific resistance set to 10<8> to 10<13>Ω.cm at 20 deg.C, and the metallic element is Mo or W.</p>
申请公布号 JPH11111828(A) 申请公布日期 1999.04.23
申请号 JP19970282640 申请日期 1997.09.30
申请人 SHIN ETSU CHEM CO LTD 发明人 MOGI HIROSHI;OTANI YOSHIKAZU;ARAI KENICHI;KOJIMA SHINJI;KOBAYASHI TOSHIMI
分类号 B23Q3/15;B25B11/00;H01L21/683;H02N13/00;(IPC1-7):H01L21/68 主分类号 B23Q3/15
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