| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. excellent in adhesion to copper and chemical resistance, ensuring low COD and low BOD at the time of treating waste water and having low flocculating property in a developing tank and to obtain a photosensitive element with a layer of the photosensitive resin compsn. SOLUTION: The photosensitive resin compsn. contains (A) a thermoplastic polymer obtd. by copolymerizing 15-35 wt.% 3-15C carboxyl group-contg. a,β-unsatd. monomer with 1-40 wt.% styrene monomer represented by the formula [where R<1> is H or 1-4C alkyl, X is halogen or 1-4C alkyl, (n) is an integer of 0-3, and in the case of n>=2, plural X's may be the same or different], 10-70 wt.% methacrylate having a 1-8C alkyl group and 0-40 wt.% acrylate having a 1-8C alkyl group, (B) a photopolymn. initiator and (C) a photopolymerizable compd. having a polymerizable ethylenic unsatd. group. The photosensitive resin compsn. is applied on a substrate and dried to form the objective photosensitive element. |
