发明名称 HOLDING DEVICE AND PROCESSING DEVICE MOUNTING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To uncrack even at a high temperature and unremove an electrostatic chuck from a metallic heater due to a thermal distortion, by a method wherein a thermal expansion buffer layer having an intermediate thermal expansion coefficient between thermal expansion coefficients of the electrostatic chuck, and a heater is provided between the electrostatic chuck and the heater and jointed thereto. SOLUTION: A holding device comprises a metallic heater 3 in which a heating body 5 is buried, an electrostatic chuck 11 made of ceramics, and a thermal expansion buffer layer 6 joined and provided between the heater 3 and the electrostatic chuck 11. The thermal expansion buffer layer 6 has a thermal expansion coefficient between that of the electrostatic chuck 11 and that of the heater 3. Thus, a difference in the thermal expansion coefficients between the electrostatic chuck 11 and the heater 3 is scattered as a small difference in the thermal expansion coefficients between the electrostatic chuck 11 and the thermal expansion buffer layer 6 and a small difference in the thermal expansion coefficients between the heater 3 and the thermal expansion buffer layer 6, and a stress distortion due to a difference in the thermal expansion coefficients applied on the electrostatic chuck 11 is reduced.</p>
申请公布号 JPH11111827(A) 申请公布日期 1999.04.23
申请号 JP19970275442 申请日期 1997.10.08
申请人 TOKYO ELECTRON LTD;AM TECHNOLOGY:KK 发明人 ARAMI JIYUNICHI;KAWANAMI HIROSHI;ENDOU SHIYOUSUKE;SUZUKI NOBUYUKI
分类号 B23Q3/15;C23C16/46;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 主分类号 B23Q3/15
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